Thin films engineering of indium tin oxide: Large area flat panel displays application

@inproceedings{Betz2006ThinFE,
  title={Thin films engineering of indium tin oxide: Large area flat panel displays application},
  author={Ulrich Dipl Ing Betz and M. Kharrazi Olsson and J. Marthy and Marcela Ferrari Escol{\'a} and Fachri Atamny},
  year={2006}
}
  • Ulrich Dipl Ing Betz, M. Kharrazi Olsson, +2 authors Fachri Atamny
  • Published 2006
  • Materials Science
  • Indium Tin Oxide (ITO) thin films with a variety of microstructures were deposited using a large area conventional DC magnetron sputtering system for flat panel displays manufacturing. Highly uniform ITO films with an average thickness of ∼100 ± 3 nm on the ∼0.6 m2 substrate area were obtained. Film structures with small amounts of crystalline sites were produced by room temperature deposition, and an entirely amorphous structure with excellent etching properties was achieved through optimized… CONTINUE READING

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