Thin-film Silicon Solar Cell Technology

@inproceedings{Shah2004ThinfilmSS,
  title={Thin-film Silicon Solar Cell Technology},
  author={Arvind V. Shah and Horst Dipl. Ing. Schade and Milan Vaně{\vc}ek and Johannes Meier and Evelyne Vallat-Sauvain and Nicolas Wyrsch and Ulrich Kroll and Corinne Droz and Julien Bailat},
  year={2004}
}
This paper describes the use, within p–i–n- and n–i–p-type solar cells, of hydrogenated amorphous silicon (a-Si:H) and hydrogenated microcrystalline silicon (μc-Si:H) thin films (layers), both deposited at low temperatures (200°C) by plasma-assisted chemical vapour deposition (PECVD), from a mixture of silane and hydrogen. Optical and electrical properties of the i-layers are described. These properties are linked to the microstructure and hence to the i-layer deposition rate, that in turn… CONTINUE READING

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