Thickness dependent chemical and microstructural properties of DC reactive magnetron sputtered titanium nitride thin films on low carbon steel cross-section

@inproceedings{Ajenifuja2018ThicknessDC,
  title={Thickness dependent chemical and microstructural properties of DC reactive magnetron sputtered titanium nitride thin films on low carbon steel cross-section},
  author={Emmanuel Ajenifuja and Abimbola Patricia Idowu Popoola and Olawale Popoola},
  year={2018}
}
Polished samples of low carbon steel (LCS) rod cross-sections were sputtered with different thicknesses of TiNx thin film using DC reactive magnetron sputtering technique. While other process parameters such as target power (200 W), substrate position (150 mm) and sputtering pressure (1.33 Pa) were kept constant during the deposition, the deposition time… CONTINUE READING