Thermal expansion behavior of ultrathin polymer films supported on silicon substrate.

@article{Miyazaki2004ThermalEB,
  title={Thermal expansion behavior of ultrathin polymer films supported on silicon substrate.},
  author={Tsukasa Miyazaki and K. Nishida and Toshiji Kanaya},
  journal={Physical review. E, Statistical, nonlinear, and soft matter physics},
  year={2004},
  volume={69 6 Pt 1},
  pages={061803}
}
The thermal expansion behavior of polystyrene (PS) thin films was investigated using x-ray reflectivity, focusing on ultrathin films below 10 nm. It was found that the glass transition temperature T(g) decreases with thickness as reported by many researchers while it is almost independent of thickness and constant at 354 K for films below approximately 10 nm. The thickness dependence of T(g) was well reproduced by a two-layer model consisting of a mobile surface layer with T(g) of 354.5 K and a… CONTINUE READING
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