Thermal contact resistance between graphene and silicon dioxide

@inproceedings{Chen2009ThermalCR,
  title={Thermal contact resistance between graphene and silicon dioxide},
  author={Zhen Chen and Wanyoung Jang and Wenzhong Bao and Chun Ning Lau and Chris Dames},
  year={2009}
}
The thermal contact resistance between graphene and silicon dioxide was measured using a differential 3ω method. The sample thicknesses were 1.2 (single-layer graphene), 1.5, 2.8, and 3.0 nm, as determined by atomic force microscopy. All samples exhibited approximately the same temperature trend from 42 to 310 K, with no clear thickness dependence. The contact resistance at room temperature ranges from 5.6×10−9 to 1.2×10−8 m2 K/W, which is significantly lower than previous measurements… CONTINUE READING

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