The use of atomic layer deposition in advanced nanopatterning.

Abstract

Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with atomic level control of the thickness and an excellent conformality on 3-dimensional surfaces. In recent years, ALD has been implemented in many applications in microelectronics, for which often a patterned film instead of full area coverage is required. This article… (More)
DOI: 10.1039/c4nr01954g

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