The role of secondary electrons in electron-beam-induced- deposition spatial resolution

Abstract

Electron-beam-induced-deposition (EBID) is a versatile direct writing technique occasionally used in microand nanofabrication. We focus in our study on the EBID spatial resolution, defined as the lateral size of the smallest deposited structure. The lateral size of dot structures always exceeds the diameter of the electron probe. Many authors have argued… (More)

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Cite this paper

@inproceedings{Kruit2002TheRO, title={The role of secondary electrons in electron-beam-induced- deposition spatial resolution}, author={P. C. van de Kruit}, year={2002} }