The role of etching anisotropy in the fabrication of freestanding oxide microstructures on SrTiO3(100), SrTiO3(110), and SrTiO3(111) substrates

  title={The role of etching anisotropy in the fabrication of freestanding oxide microstructures on SrTiO3(100), SrTiO3(110), and SrTiO3(111) substrates},
  author={Alejandro Enrique Plaza and Nicola Manca and Cristina Bernini and Daniele Marr'e and Luca Pellegrino},
  journal={Applied Physics Letters},
The release process for the fabrication of freestanding oxide microstructures relies on appropriate, controllable and repeatable wet etching procedures. SrTiO3 is among the most employed substrates for oxide thin films growth and can be decomposed in HF:water solution. Such process is strongly anisotropic and is affected by local defects and substrate cut-plane. We analyze the etching behavior of SrTiO3 substrates having (100), (110), and (111) cut-planes during immersion in a 5% HF:water… Expand

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