The mechanism behind the selective metal nanoscale etch method for precise metal nanopatterning.

@article{Lee2009TheMB,
  title={The mechanism behind the selective metal nanoscale etch method for precise metal nanopatterning.},
  author={Byung Chul Lee and Moo Hyun Kim and Jegatha Nambi Krishnan and Sang Kyung Kim and Sung Moon and Sang Youp Lee and Hyun Joon Shin},
  journal={Nanotechnology},
  year={2009},
  volume={20 6},
  pages={
          065302
        }
}
This paper reports for the first time the exact mechanism of the selective metal nanoscale etch method (SMNEM), which is a simply controllable and cost-effective approach for metal nanoscale etching and size reduction. This method is based on the galvanic displacement, Kirkendall effect, and selective etching. The size reduction is linearly controlled by the galvanic displacement in the early stage (1 min). In the later stage, a Kirkendall void is formed between the Ni and Au layer, which is… CONTINUE READING
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