• Corpus ID: 2190797

The echo-enabled harmonic generation options for FLASH II

@article{Deng2011TheEH,
  title={The echo-enabled harmonic generation options for FLASH II},
  author={Haixiao Deng and Winfried Decking and Bart Faatz Shanghai Institute of Applied Physics and Shanghai and China. and Deutsches Elektronen-Synchrotron and Hamburg and H Germany},
  journal={arXiv: Accelerator Physics},
  year={2011}
}
FLASH II is an upgrade to the existing free electron laser (FEL) FLASH. The echo-enabled harmonic generation (EEHG) scheme is proposed to be a potential seeding option of FLASH II. In this paper, the possibility of EEHG operation of FLASH II is investigated for the first time. With a combination of existing numerical codes, i.e. a laser-beam interaction code in an undulator (LBICU), a beam tracking code in a chicane (ELEGANT) and an universal FEL simulating code (GENESIS), the effects of beam… 
Echo-enabled harmonic generation for seeded FELs
In the x-ray wavelengths, the two leading FEL concepts are the self-amplied spontaneous emission (SASE) conguration and the high-gain harmonic generation (HGHG) scheme. While the radiation from a
Discussion on CSR instability in EEHG Simulation
Echo-Enabled Harmonic Generation (EEHG) is an external seeding technique for XUV and soft X-ray Free Electron Lasers (FEL). It has recently been experimentally demonstrated and currently many
NEW USES FOR THE ORS SECTION AT FLASH
The Optical Replica Synthesizer (ORS) section at the Free-electron LASer in Hamburg (FLASH) was constructed to make longitudinal electron bunch pro file measurements and to diagnose the stability of
Progress towards ECHO-seeding in the FLASH ORS section
TLDR
It is anticipated that echo-seeding in the ORS section can produce harmonics of the 270 nm seed laser wavelength, generating seeded FEL radiation in the sFLASH undulators with wavelengths ranging from 10 nm to 30 nm.
FLASH II : A PROJECT UPDATE
FLASH has been a user facility since 2005, delivering radiation in the wavelength range between 4.1 and 45 nm using the SASE principle. So far the user requests for beam time by far exceeds the time
STATUS OF THE FLASH II PROJECT
The extension of the FLASH facility at DESY (Hamburg, Germany) – FLASH II Project – is under way. The extension includes a second undulator line with variable gap undulators to allow a more flexible

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