The applications of transmission electron microscopy to the characterization of metal thin films on silicon

@inproceedings{Chen1990TheAO,
  title={The applications of transmission electron microscopy to the characterization of metal thin films on silicon},
  author={Lin Chen and Water Lur and Joy Y. Cheng},
  year={1990}
}
Abstract The applications of transmission electron microscopy (TEM) to the characterization of metal thin films on silicon are reviewed. A historical perspective and an account of the contribution of TEM to the study of interfacial reactions of metal thin films on silicon are given. Recent developments in the growth of transition metal silicides on silicon including (1) the formation and growth of amorphous interlayers between metal thin films and silicon, (2) the effects of lateral… CONTINUE READING

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