The New , New Limits of Optical Lithography

@inproceedings{Mack2004TheN,
  title={The New , New Limits of Optical Lithography},
  author={Chris A. Mack},
  year={2004}
}
The end of optical lithography has been so often predicted (incorrectly) that such predictions are now a running joke among lithographers. Yet optical lithography does have real, physical limitations and even more real economic limits, and an accurate estimation of these limits is essential for planning potential next generation lithography (NGL) efforts. This paper will review the two types of resolution limits in optical lithography: the pitch resolution, governed by the amount of spatial… CONTINUE READING

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Off-Axis Illumination,

  • C. A. Mack
  • Microlithography World (August
  • 2003
1 Excerpt

Resolution Enhancement Technologies,

  • C. A. Mack
  • Microlithography World (May
  • 2003
1 Excerpt

Process Settings and Process Latitude,

  • C. A. Mack
  • Microlithography World (August
  • 2002
1 Excerpt

Pitch: The Other Resolution,

  • C. A. Mack
  • Microlithography World (Summer
  • 1998
1 Excerpt

Resolution,” Microlithography

  • C. A. Mack
  • World (Winter
  • 1997
1 Excerpt

Depth of Focus,

  • C. A. Mack
  • Microlithography World (Spring
  • 1995
1 Excerpt

Depth of Focus, part 2,

  • C. A. Mack
  • Microlithography World (Autumn
  • 1995
1 Excerpt

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