The MEMSNAS process: microloading effect for micromachining 3-D structures of nearly all shapes

Abstract

We propose a technological process for microfabrication of three-dimensional (3-D) structures with nearly all shapes. This is a one-mask process that uses equipment, widespread in the microelectronics laboratories and industry. The main idea is to take advantage from the microloading effect of reactive ion etching (RIE) in order to obtain multiple levels of… (More)

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@article{Bourouina2004TheMP, title={The MEMSNAS process: microloading effect for micromachining 3-D structures of nearly all shapes}, author={Tarik Bourouina and Toshiyuki Masuzawa and Hiroaki Fujita}, journal={Journal of Microelectromechanical Systems}, year={2004}, volume={13}, pages={190-199} }