The Evolution of Silicon Wafer Cleaning Technology

@article{Kern1990TheEO,
  title={The Evolution of Silicon Wafer Cleaning Technology},
  author={Werner Kern},
  journal={Journal of The Electrochemical Society},
  year={1990},
  volume={137},
  pages={1887-1892}
}
  • W. Kern
  • Published 1 June 1990
  • Engineering
  • Journal of The Electrochemical Society
The purity of wafer surfaces is an essential requisite for the successful fabrication of VLSI and ULSI silicon circuits. Wafer cleaning chemistry has remained essentially unchanged in the past 25 years and is based on hot alkaline and acidic hydrogen peroxide solutions, a process known as "RCA Standard Clean." This is still the primary method used in the industry. What has changed is its implementation with optimized equipment: from simple immersion to centrifugal spraying, megasonic techniques… 
Silicon wafers preparation and properties
  • M. Tilli
  • Engineering, Materials Science
  • 2010
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