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MODELING OF THE RADIATION ENVIRONMENT IN THE LOWER CHAMBER OF RAPID THERMAL PROCESSING FURNACES
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A learning approach of wafer temperature control in a rapid thermal processing system
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Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities
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An interactive system for the estimation of emissivity of a wafer in a rapid thermal processing chamber
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Emissivity measurements and modeling of silicon related materials and structures
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