Tailoring nanoporous materials by atomic layer deposition.

Abstract

Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating reactions between gas phase precursor molecules and a solid surface. The self-limiting nature of the chemical reactions ensures precise film thickness control and excellent step coverage, even on 3D structures with large aspect ratios. At present, ALD is mainly… (More)
DOI: 10.1039/c1cs15091j

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