Tailoring broadband antireflection on a silicon surface through two-step silver-assisted chemical etching.


Combined nanostructure arrays with tailored structural profiles are presented (see picture, GN: graded nanostructure). These arrays exhibit a sharp decrease in reflectivity when submitted to strong sunlight irradiation, showing great potential for diverse applications, such as optical and electro-optical devices and other antireflection designs. 
DOI: 10.1002/cphc.201100981


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