TIME-RESOLVED MEASUREMENTS OF HIGHLY POLYMERIZED NEGATIVE IONS IN RADIO FREQUENCY SILANE PLASMA DEPOSITION EXPERIMENTS

@article{Howling1994TIMERESOLVEDMO,
  title={TIME-RESOLVED MEASUREMENTS OF HIGHLY POLYMERIZED NEGATIVE IONS IN RADIO FREQUENCY SILANE PLASMA DEPOSITION EXPERIMENTS},
  author={A. Howling and L. Sansonnens and J. Dorier and C. Hollenstein},
  journal={Journal of Applied Physics},
  year={1994},
  volume={75},
  pages={1340-1353}
}
The time‐resolved fluxes of negative polysilicon hydride ions from a power‐modulated rf silane plasma have been measured by quadrupole mass spectrometry and modeled using a simple polymerization scheme. Experiments were performed with plasma parameters suitable for high‐quality amorphous silicon deposition. Polysilicon hydride anions diffuse from the plasma with low energy (approximately 0.5 eV) during the afterglow after the electron density has decayed and the sheath fields have collapsed… Expand
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Reactive plasmas are highly valued for their ability to produce large amounts of reactive radicals and of energetic ions bombarding surrounding surfaces. The non-equilibrium electron driven plasmaExpand
Negative gas-phase ion chemistry of silane: A quadrupole ion trap study.
TLDR
A quadrupole ion trap study of the self-condensation ion/molecule reactions of anions of silane, finding that the most abundant ions in the mass spectra are those with a low content of hydrogen, namely Si2H-, Si3H-, and Si4H-. Expand
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The evolutions of negative ions in the silane plasma chemical vapor deposition (PCVD) reactor for semiconductor processing were analyzed, considering the effects of chemical reactions, fluidExpand
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References

SHOWING 1-10 OF 67 REFERENCES
Positive and negative ions in silane and disilane multipole discharges
Mass spectra have been obtained for positive and negative ions extracted from a multipole discharge where thin films of hydrogenated amorphous silicon are produced from silane and disilane plasmaExpand
Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition
It is now generally recognized that the excitation frequency is an important parameter in radio‐frequency (rf) plasma‐assisted deposition. Very‐high‐frequency (VHF) silane plasmas (50–100 MHz) haveExpand
Ion–molecule reactions in a direct current silane glow discharge
We have measured the composition distribution of positive silane ions in a dc silane glow discharge as a function of pressure, flow, and cathode‐to‐anode separation. The ions were sampled through theExpand
Negative Ion Kinetics in RF Glow Discharges
Using temporally and spatially resolved laser spectroscopy, we have determined the identities, approximate concentrations, effects on the local field, and kinetics of formation and loss of negativeExpand
Negative-Ion Mass-Spectra and Particulate Formation in Radio-Frequency Silane Plasma Deposition Experiments
Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groupsExpand
Negative hydrogenated silicon ion clusters as particle precursors in RF silane plasma deposition experiments
Stable negative ions containing up to sixteen silicon atoms have been measured by mass spectrometry in RF power-modulated silane plasmas for amorphous silicon deposition. These hydrogenated siliconExpand
Temporal behavior of the electron and negative ion densities in a pulsed radio‐frequency CF4 plasma
Electron and negative ion densities in the afterglow and in the plasma initiation phase of a 13.56‐MHz rf discharge in CF4 were measured by using a microwave cavity method and a laser photodetachmentExpand
Detection of Negative Ions in a Helium-Silane RF Plasma
In order to detect negative ions in a helium-silane rf plasma, temporal evolutions of the densities of electrons and ions are observed by square-wave-amplitude modulation of an rf discharge voltage.Expand
Particulate generation in silane/ammonia rf discharges
The rate of particle generation in a SiH4/NH3 rf discharge has been studied as a function of the discharge operating parameter space, electrode geometry, and power supply coupling mode. MeasurementsExpand
Enhancement of the negative ion flux to surfaces from radio‐frequency processing discharges
The relative flux of negative ions from rf discharges through CF4 and F2‐He has been studied using mass spectrometry. The negative ion flux impinging on a surface in contact with a glow discharge isExpand
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