Synthesis of Fe metal precipitated colloidal silica and its application to W chemical mechanical polishing (CMP) slurry.

@article{Kang2010SynthesisOF,
  title={Synthesis of Fe metal precipitated colloidal silica and its application to W chemical mechanical polishing (CMP) slurry.},
  author={Young-Jae Kang and Y Nagendra Prasad and In-Kwon Kim and Seok-Jo Jung and Jin-Goo Park},
  journal={Journal of colloid and interface science},
  year={2010},
  volume={349 1},
  pages={402-7}
}
The objective of this paper is to develop a new method of Fe (metal) precipitation on colloidal silica to overcome the stability problem, which would be responsible in producing defects, with commercially available fumed silica slurry containing Fe ions. The slurry was developed by using sodium silicate (Na(2)SiO(3)) as a raw material and the concentration of precipitation of metal was controlled by addition of Fe salt (Fe(NO(3))(3)). To compare the concentration of precipitated Fe with… CONTINUE READING