Surface micromachining for microelectromechanical systems

@inproceedings{Bustillo1998SurfaceMF,
  title={Surface micromachining for microelectromechanical systems},
  author={James Bustillo and Roger T. Howe and Richard S. Muller},
  year={1998}
}
Surface micromachining is characterized by the fabrication of micromechanical structures from deposited thin films. Originally employed for integrated circuits, films composed of materials such as low-pressure chemical-vapor-deposition polycrystalline silicon, silicon nitride, and silicon dioxides can be sequentially deposited and selectively removed to build or "machine" three-dimensional structures whose functionality typically requires that they be freed from the planar substrate. Although… Expand
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