Surface micromachining for microelectromechanical systems

  title={Surface micromachining for microelectromechanical systems},
  author={James Bustillo and Roger T. Howe and Richard S. Muller},
Surface micromachining is characterized by the fabrication of micromechanical structures from deposited thin films. Originally employed for integrated circuits, films composed of materials such as low-pressure chemical-vapor-deposition polycrystalline silicon, silicon nitride, and silicon dioxides can be sequentially deposited and selectively removed to build or "machine" three-dimensional structures whose functionality typically requires that they be freed from the planar substrate. Although… Expand
Deposition of Low Stress Silicon Nitride Thin Film and Its Application in Surface Micromachining Device Structures
Surface machining processes are responsible for creating microstructures that reside near the surfaces of a substrate and are characterized by the fabrication of micromechanical structures fromExpand
Chapter 24 – Surface Micromachining
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In this article, we report a simple and inexpensive approach to micromolding of complex, three-dimensional, high aspect ratio structures (with non-line-of-sight features) out of a high-strengthExpand
Chemical mechanical planarization: an effective microfabrication and micromachining technology for MEMS
Chemical mechanical planarization (CMP) is an integral process in the semiconductor industry that enables the fabrication of advanced integrated circuit (IC) components. It is the method of choiceExpand
Roughness characterisation of gas phase micromachining process suitable for fabricating silicon based microsystems
The surface roughness characterisation of gas phase micromachining with XeF2 that is suitable for fabricating integrated MEMS with both micromechanical and microelectronics components is presented. Expand
Fabrication and material characterization of silver cantilevers via direct surface micromachining
Microelectromechanical Systems (MEMS) rely heavily on the semiconductor industry's manufacturing paradigm. While the standardized process model allows semiconductor chips to benefit from economy ofExpand
Chapter Twenty Eight – Surface Micromachining
Publisher Summary Surface Micromachining is called so because instead of crystal silicon substrate as functioning material this new technology uses thin film layers deposited on the substrateExpand
A New Micromachining Technique with (111) Silicon
A new micromachining technology using (111)-oriented silicon is developed. This technology allows advanced surface micromachining with the advantages of using bulk silicon. It utilizes reactive ionExpand
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A micropunching lithography method (MPL) to overcome the obstacles of patterning conducting polymers and generating sidewall patterns and direct horizontal growth of nanowires and nanotubes is developed. Expand
Surface micromachining of chip-edge silicon microcantilevers using xenon difluoride etching of silicon-on-insulator
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Applications of silicon micromachining to resonator fabrication
  • R. Howe
  • Materials Science
  • Proceedings of IEEE 48th Annual Symposium on Frequency Control
  • 1994
This paper surveys recent developments in using silicon micromachining processes to fabricate micromechanical resonant structures for sensors, filters, and oscillators. Single-crystal silicon andExpand
Surface micromachining for microsensors and microactuators
Micromechanical structures can be made by selectively etching sacrificial layers from a multilayer sandwich of patterned thin films. This paper reviews this technology, termed surface micromachining,Expand
Material and processing issues for the monolithic integration of microelectronics with surface-micromachined polysilicon sensors and actuators
The monolithic integration of micromechanical deviecs with their controlling electronics offers potential increases in performance as well as decreased cost for these devices. Analog devices hasExpand
Thick polycrystalline silicon for surface-micromechanical applications: deposition, structuring and mechanical characterization
Abstract Polysilicon films are deposited in an epitaxial batch reactor. The deposition rate is of the order of 0.5 μm min−1, which makes a layer thickness of 10 μm or more possible. These films areExpand
Thick Polycristalline Silicon For Surface Micromechanical Applications: Deposition, Structuring And Mechanical Characterization
  • P. Lange, M. Kirsten, +5 authors J. Schweitz
  • Materials Science
  • Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95
  • 1995
Polysilicon films were deposited in an epitaxial batch reactor. The deposition rate is in the order of 0.5 /spl mu/m/min which makes a layer thickness of 10 /spl mu/m or more possible. These filmsExpand
Bulk micromachining of silicon
Bulk silicon etching techniques, used to selectively remove silicon from substrates, have been broadly applied in the fabrication of micromachined sensors, actuators, and structures. Despite the moreExpand
Sacrificial aluminum etching for CMOS microstructures
  • O. Paul, D. Westberg, M. Hornung, V. Ziebart, H. Baltes
  • Materials Science
  • Proceedings IEEE The Tenth Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots
  • 1997
This paper reports recent advances in surface micromachining by sacrificial aluminum etching (SALE). This method is applied to standard CMOS substrates in a single-mask, or even maskless,Expand
Fabrication of micromechanical devices from polysilicon films with smooth surfaces
Abstract Micromechanical devices such as bearings require smooth surfaces. Fine-grained polysilicon can be produced with a surface roughness near 8Arms. The ability to anneal films of this type intoExpand
Application of chemical-mechanical polishing to planarization of surface-micromachined devises
Chemical-Mechanical Polishing (CMP) has emerged as an enabling technology for manufacturing multi-level metal interconnects used in high-density Integrated Circuits (IC). In this work we presentExpand
Surface-micromachined microoptical elements and systems
This paper examines some of the results obtained and attempts to project possibilities for surface micromachining in future optical systems, with the demonstration that surface-micromachined elements can be "folded" out from the plane in which they are constructed. Expand