Surface coating of small SiO2 particles with a WO3 thin film by barrel-sputtering method

@inproceedings{Abe2007SurfaceCO,
  title={Surface coating of small SiO2 particles with a WO3 thin film by barrel-sputtering method},
  author={Takayuki Abe and Hiromi Hamatani and Shingo Higashide and Masanori Hara and Satoshi Akamaru},
  year={2007}
}
Abstract Surface coating of small SiO 2 flakes with a WO 3 thin film was carried out by using a hexagonal-barrel-sputtering method. In order to find suitable sputtering conditions using this method, the WO 3 film was coated on the glass plate by reactive sputtering under desired total pressures, oxygen fractions, and substrate temperatures. By the analysis of XRD patterns, the suitable conditions prepared for the WO 3 film were determined to be a total pressure of 0.6 Pa, an oxygen fraction of… CONTINUE READING

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