Surface Defect Characterization in Oxygen-Dosed Nickel Surfaces and in NiO Thin Films by CO Adsorption−Desorption Experiments

@article{and1997SurfaceDC,
  title={Surface Defect Characterization in Oxygen-Dosed Nickel Surfaces and in NiO Thin Films by CO Adsorption−Desorption Experiments},
  author={Helmut {\"O}fner and and F. Zaera},
  journal={Journal of Physical Chemistry B},
  year={1997},
  volume={101},
  pages={9069-9076}
}
Oxygen-covered Ni(110) as well as thin NiO films grown by oxidation of that surface were characterized under ultrahigh vacuum by using low-energy electron diffraction (LEED), X-ray photoelectron (XPS), Auger (AES), and ion scattering (ISS) spectroscopies together with CO temperature-programmed desorption (TPD) titrations. Results from NiO(100) films with surface defects induced via Ar+ ion irradiation at room temperature were compared with those from partially oxidized ordered Ni(110) surfaces… Expand
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