Submicron-patterning of bulk titanium by nanoimprint lithography and reactive ion etching.

@article{Domanski2012SubmicronpatterningOB,
  title={Submicron-patterning of bulk titanium by nanoimprint lithography and reactive ion etching.},
  author={Maciej Domanski and Regina Luttge and Edwin A D Lamers and X Frank Walboomers and Louis A J A Winnubst and John A. Jansen and Johannes G E Gardeniers},
  journal={Nanotechnology},
  year={2012},
  volume={23 6},
  pages={065306}
}
Nanopatterns on titanium may enhance endosseous implant biofunctionality. To enable biological studies to prove this hypothesis, we developed a scalable method of fabricating nanogrooved titanium substrates. We defined nanogrooves by nanoimprint lithography (NIL) and a subsequent pattern transfer to the surface of ASTM grade 2 bulk titanium applying a soft-mask for chlorine-based reactive ion etching (RIE). With respect to direct write lithographic techniques the method introduced here is fast… CONTINUE READING