Subdiffraction light focusing using a cross sectional ridge waveguide nanoscale aperture.

Abstract

We report a new type of plasmonic nanoscale ridge aperture and its fabrication process which is based on layer-by-layer planar lithography. This new fabrication method allows us to create desired nanoscale features of a plasmonic ridge waveguide nanoscale aperture, which helps to confine a near-field spot to sub-wavelength dimensions. Numerical simulations… (More)
DOI: 10.1364/OE.24.026016

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Cite this paper

@article{Traverso2016SubdiffractionLF, title={Subdiffraction light focusing using a cross sectional ridge waveguide nanoscale aperture.}, author={Luis Miguel Traverso and Anurup Datta and Xianfan Xu}, journal={Optics express}, year={2016}, volume={24 23}, pages={26016-26023} }