Study on the postbaking process and the effects on UV lithography of high aspect ratio SU-8 microstructures

@inproceedings{Williams2004StudyOT,
  title={Study on the postbaking process and the effects on UV lithography of high aspect ratio SU-8 microstructures},
  author={John Dalton Williams and Wanjun Wang},
  year={2004}
}
John D. Williams Wanjun Wang Louisiana State University Department of Mechanical Engineering Baton Rouge, Louisiana 70803 E-mail: wang@lsu.edu Abstract. In recent years, a relatively new type of negative photoresist, EPON SU-8, has received a lot of attention in the MEMS field because of its excellent lithography properties. Significant research efforts have been made to study the lithographic properties of SU-8 to obtain high aspect ratio microstructures with good sidewall quality. Currently… CONTINUE READING