Study of CrNx and NbC interlayers for HFCVD diamond deposition onto WC–Co substrates

@inproceedings{Petrikowski2013StudyOC,
  title={Study of CrNx and NbC interlayers for HFCVD diamond deposition onto WC–Co substrates},
  author={K. Petrikowski and Martin Fenker and Jan G{\"a}bler and Andreas Dipl.-Phys. Hagemann and Sven T Pleger and Lothar Schaefer},
  year={2013}
}
Abstract Chromium nitride (CrN x ) and niobium carbide (NbC) films were deposited by magnetron sputtering on Co-cemented tungsten carbide (WC–Co) substrates and diamond deposition was performed by using hot-filament chemical vapor deposition (HFCVD) technique. The CrN x and NbC interlayers have been deposited at different substrate temperatures (T S  = 400, 550 and 700 °C). The stability of these interlayers for diamond deposition has been studied by a heat treatment in H 2 atmosphere for 60 h… CONTINUE READING

Citations

Publications citing this paper.