Structural properties of single and multilayer ITO and TiO2 films deposited by reactive pulsed laser ablation deposition technique

@inproceedings{Ngaffo2007StructuralPO,
  title={Structural properties of single and multilayer ITO and TiO2 films deposited by reactive pulsed laser ablation deposition technique},
  author={Fernande Fotsa Ngaffo and Anna Paola Caricato and Manuel Fernandez and Maurizio Martino and Francesco Bryan Romano},
  year={2007}
}
Abstract Indium tin oxide (ITO) and titanium dioxide (TiO 2 ) single layer and double layer ITO/TiO 2 films were prepared using reactive pulsed laser ablation deposition (RPLAD) with an ArF excimer laser. The films were deposited on SiO 2 substrates heated at 200 and 400 °C. ITO and TiO 2 films with uniform thicknesses of about 400 and 800 nm, respectively, over large areas were prepared. X-ray diffraction (XRD) analysis revealed that the ITO films are formed of highly orientated nanocrystals… CONTINUE READING

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