Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams

@inproceedings{Goh2013StructuralAO,
  title={Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams},
  author={Boon Tong Goh and Siew Kien Ngoi and Seong Ling Yap and Chiow San Wong and Chang Fu Dee and Saadah Abdul Rahman},
  year={2013}
}
Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effects of the energetic ion beam irradiations on the structural and optical properties of the nc-Si:H thin films have been studied. The results show that the formation of Si nano-crystallites embedded within the amorphous matrix was enhanced with an increase in… CONTINUE READING

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