Structural and Electrical Properties of BiFeO3 Thin Films Prepared by the Pulsed Laser Deposition Method

Abstract

La-doped BiFeO3 (BLFO) thin films have been deposited on Pt (Ill)/TiO2/SiO2/Si (100) substrates under different oxygen pressure of 5 mTorr -50 mTorr by the pulsed-laser deposition (PLD). The effects of oxygen pressure on crystal structure and ferroelectric properties have been investigated. X-ray diffraction analysis shows that the BLFO thin films are of… (More)

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