Structural Characterization of ZrO 2 Thin Films Produced via Self-Assembled Monolayer-Mediated Deposition Aqueous Dispersions

Abstract

Thin ZrO2 films were produced at 323K by deposition of colloids from stable, aqueous dispersions (formed from 4mM Zr(SO4)2 in 0.4N HCl) onto silicon wafer-supported, functionalized self-assembled monolayers (SAMs). Deposition took place without visible bulk precipitation. As-deposited and heat-treated films were characterized by high-resolution transmission… (More)

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