• DOI:10.1063/1.2840131
• Corpus ID: 118490283

Structural, magnetic, and mechanical properties of 5μm thick SmCo films suitable for use in microelectromechanical systems

@article{Walther2008StructuralMA,
  title={Structural, magnetic, and mechanical properties of 5$\mu$m thick SmCo films suitable for use in microelectromechanical systems},
  author={Arnaud Walther and Kirill Khlopkov and Oliver Gutfleisch and Dominique Givord and Nora M. Dempsey},
  journal={Journal of Applied Physics},
  year={2008},
  volume={103},
  pages={043911}
}

• A. Walther, K. Khlopkov, +2 authors N. Dempsey
• Published 28 February 2008
• Materials Science, Physics
• Journal of Applied Physics

5μm thick SmCo films were deposited onto Si substrates using triode sputtering. A study of the influence of deposition temperature (Tdep⩽600°C) on the structural, magnetic, and mechanical properties has shown that optimum properties [highest degree of in-plane texture, maximum in-plane coercivity and remanence (1.3 and 0.8T, respectively), and no film peel-off] are achieved for films deposited at the relatively low temperature of 350°C. This temperature is compatible with film integration into microelectromechanical systems. The deposition rate was increased from 3.6to18μm∕h by increasing the surface area of the target from 7to81cm2 while keeping the target potential fixed. Mechanically intact films could be prepared by deposition onto prepatterned films or deposition through a mask.