Stress tuning in sputter-deposited MoO x films

  title={Stress tuning in sputter-deposited MoO x films},
  author={J.-Y. Faou and Etienne Barthel and S. Y. Grachev},
The evolution of the compressive stress in Mo / Ox sputter-deposited thin films has been followed in situ d uring deposition as a function of two parameters: the oxygen flux and the negative v oltage bias applied to the substrate. In addition the micros tructure of the films has been characterized. Oxygen accumulation at the interface was observed. We… CONTINUE READING