Stress Effects CoCr₂O₄ Film on MgO and MgAl₂O₄ Grown by RF-Sputter Process

@inproceedings{Ko2008StressEC,
  title={Stress Effects CoCr₂O₄ Film on MgO and MgAl₂O₄ Grown by RF-Sputter Process},
  author={Hoon Ko and Kang Ryong Choi and Seung-Iel Park and In Bo Shim and Sam Jin Kim and Chang Gyoun Kim},
  year={2008}
}
Multiferroic CoCr2O4 film was deposited on MgO and MgAl₂O₄ substrates by the rf-sputtering process. The films were prepared at an RF-magnetron sputtering power of 50 W and a pressure of 10 mtorr (20 sccm in Ar), and at substrate temperatures of 550 ℃. The crystal structure was determined to be a spinel (Fd-3m) structure by means of X-ray diffraction (XRD) with Cu K¥a radiation. The thickness and morphology of the films were measured by scanning electron microscopy (SEM) and atomic force… CONTINUE READING

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