Steady-state regression analysis and optimization of multivariable plasma etching system

@article{Luorong1994SteadystateRA,
  title={Steady-state regression analysis and optimization of multivariable plasma etching system},
  author={Tan Luorong and D. Cameron and Charles McCorkell},
  journal={Proceedings of IECON'94 - 20th Annual Conference of IEEE Industrial Electronics},
  year={1994},
  volume={3},
  pages={1986-1991 vol.3}
}
The steady-state model, which relates the manipulated conditions to both the process and performance quantities, has been developed in this work for plasma etching process by regression analysis. Non-intrusive techniques, namely optical emission spectroscopy and laser interferometry, are employed to estimate the relative plasma species concentrations and electron energy of the process and real-time etch rate respectively in order to maintain the integrity of the etching environment. This… CONTINUE READING

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