Sputtering induced by highly charged 208Pbq+ bombardment on Al surface

@article{Wang2009SputteringIB,
  title={Sputtering induced by highly charged 208Pbq+ bombardment on Al surface},
  author={T. Wang and R. Cheng and H. Peng and Y. Han and Y. Xiang and Y. Zhao and G. Xiao},
  journal={Surface & Coatings Technology},
  year={2009},
  volume={203},
  pages={2383-2386}
}
Highly charged ions (HCls) carrying high Coulomb potential energy (E p ) could cause great changes in the physical and chemical properties of material surface when they bombard on the solid surface. In our work, the secondary ion yield dependence on highly charged Pb q+ (q = 4-36) bombardment on Al surface has been investigated. Aluminum films (99.99%) covered with a natural oxide film was chosen as our target and the kinetic energy (E k ) was varied between 80 keV and 400 keV. The yield with… Expand
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