Spectroscopy of SILC trap locations and spatial correlation study of percolation path in the high-κ and interfacial layer

Abstract

It has always been assumed all along that the percolation path in the high-κ (HK) and interfacial layer (IL) of dual layer dielectric stacks are perfectly aligned with each other. There is however no solid evidence to date to support this assumption because the standard stress levels applied and compliance chosen for time dependent dielectric breakdown… (More)
DOI: 10.1109/IRPS.2015.7112738

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