Spectroscopic thin film thickness measurement system for semiconductor industries

@article{Horie1994SpectroscopicTF,
  title={Spectroscopic thin film thickness measurement system for semiconductor industries},
  author={M. Horie and N. Fujiwara and M. Kokubo and N. Kondo},
  journal={Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I \& M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9)},
  year={1994},
  pages={677-682 vol.2}
}
  • M. Horie, N. Fujiwara, +1 author N. Kondo
  • Published 1994
  • Materials Science
  • Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I & M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9)
Accurate film thickness controls are indispensable for manufacturing defect-free semiconductor devices. Moreover, recent high integration requires simultaneous measurement of each film thickness and optical constants in multi-layers. This paper explains a microspectroscopic film thickness measurement system that measures film thickness at a very small spot (several micrometers in diameter) in several angstrom increments. This system also enables you to measure film thickness on bulk wafers and… Expand

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Film thickness measurement of ultrathin film using UV wavelength light