Spectroscopic thin film thickness measurement system for semiconductor industries

@article{Horie1994SpectroscopicTF,
  title={Spectroscopic thin film thickness measurement system for semiconductor industries},
  author={Masahiro Horie and Nariaki Fujiwara and Masahiko Kokubo and Nobuyuki Kondo},
  journal={Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I \& M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9)},
  year={1994},
  pages={677-682 vol.2}
}
  • M. HorieN. Fujiwara N. Kondo
  • Published 10 May 1994
  • Physics
  • Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I & M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9)
Accurate film thickness controls are indispensable for manufacturing defect-free semiconductor devices. Moreover, recent high integration requires simultaneous measurement of each film thickness and optical constants in multi-layers. This paper explains a microspectroscopic film thickness measurement system that measures film thickness at a very small spot (several micrometers in diameter) in several angstrom increments. This system also enables you to measure film thickness on bulk wafers and… 

Figures from this paper

P‐124: Methods of Measuring Thin Film Thickness on Polymer Substrate

In this paper two methods of measuring the thickness of a thin film layer on polymer substrate are presented. The first one is based on a polarizing microscope and analyzing the interference spectrum

P‐71: Spectrum Relaxation Applied to Film‐Thickness Measurement

When we used spectrometer with array sensor to calculate thickness or control refractive index, spectrum resolution was the important factor if we measured the reflectance or transmittance as our

An Optimized Monitoring Method for 28HK ILDCMP

In this paper, according to the problems encountered in the research and development of the new generation product of 28HK project of our company, the problems existing in the ILD CMP measurement of

References

SHOWING 1-2 OF 2 REFERENCES

Film thickness measurement of ultrathin film using UV wavelength light

In semiconductor production lines, film-thickness is typically measured utilizing ellipsometry or the microspectroscopic measurement. The microspectroscopic measurement is fast, highly accurate and

Study for measurement accuracy of the spectroscopic thin film thickness measurement system

The spectroscopic film thickness measurement system is generally composed of a microscope, a spectrometer, and a data processing unit, and it enables non-contact measurement of transparent films