Spectral control of emissions from tin doped targets for extreme ultraviolet lithography

  title={Spectral control of emissions from tin doped targets for extreme ultraviolet lithography},
  author={S. S. Harilal and B. O’Shay and Mark S. Tillack and Yezheng Tao and R. R. Paguio and Abbas Nikroo and Christina A. Back},
  journal={Journal of Physics D: Applied Physics},
  pages={484 - 487}
We have investigated the unresolved transition array (UTA) emission around 13.5 nm from solid density tin and tin doped foam targets. Extreme ultraviolet (EUV) spectral measurements were made in the wavelength region 11–17 nm using a transmission grating spectrograph and the EUV in-band conversion efficiency was measured using an absolutely calibrated EUV calorimeter. The aim of this work was to optimize the UTA emission with the proper density of tin dopant in low-Z foam targets. The addition… 
A tin–gold alloy based EUV source for metrology applications
Extreme ultraviolet (EUV) spectra from laser-produced plasmas of a tin–gold alloy have been recorded for a number of power densities (Φ = 8.1 × 1011 to 5.5 × 1012 W cm−2) by varying the incident
Emission characteristics and dynamics of neutral species in a laser-produced tin plasma
We investigated the emission features of tin neutrals in a laser-ablated tin plasma using time and space resolved optical emission spectroscopy. The tin plume was generated by focusing 1064 nm, 10 ns
Characterization of plasma emission in the 1-6 nm band from laser-irradiated cryogenic xenon targets
We present measurements from laser-produced plasmas generated using cryogenic Xe targets and quantify the emission characteristics in the soft x-ray region (1 to 6 nm). The system is based on a
Comparison of EUV spectral and ion emission features from laser-produced Sn and Li plasmas
Planar slabs of pure Sn and Li were irradiated with 1064 nm, 9 ns Nd:YAG laser pulses. The resulting plasmas were evaluated with an absolutely calibrated extreme ultraviolet (EUV) power tool, a
Electrochemically Synthesized Tin/Lithium Alloy To Convert Laser Light to Extreme Ultraviolet Light
Lithium–tin alloys were described as a novel target material to enhance the efficiency of 13.5 nm extreme ultraviolet (EUV) light from generated laser-produced plasmas and were slightly higher than planar tin and between tin and lithium.
Effect of focal spot size on in-band 13.5 nm extreme ultraviolet emission from laser-produced Sn plasma.
The effect of focal spot size on in-band 13.5 nm extreme ultraviolet (EUV) emission from laser-produced Sn plasmas was investigated for an EUV lithography light source and showed that the EUV emission must pass through a longer plasma with higher density when the focal spot is large.
Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources
Out-of-band (OOB) radiation, in contrast to the in-band radiation at 13.5 nm in a 2% bandwidth, emitted from dense tin plasmas generated by a laser was investigated for application as an extreme
Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application
Extreme ultraviolet lithography (EUVL) requires an emission of soft x-rays around a wavelength region of 13.5 nm. EHYBRID simulation was made under the laser operation at 1064 nm with a pulse
Low density targets for laser-produced-plasma (LPP) extreme ultraviolet light source with high-CE and toward high-repletion supply
In the present paper, we overview fabrication methods to produce density-controlled tin and xenon targets for generating extreme ultraviolet (EUV) light. The target can be classified as a
The effect of excitation wavelength on dynamics of laser-produced tin plasma
We investigated the effect of the excitation wavelength on the density evolution of laser-produced tin plasmas, both experimentally and numerically. For producing plasmas, Sn targets were excited


13.5 nm emission from composite targets containing tin
The aim of this study is to investigate ways to maximise the efficiency of tin based laser produced plasmas as sources of EUV radiation in the 2% band centered on 13.5 nm. It has been found that
Properties of EUV and particle generations from laser-irradiated solid- and low-density tin targets
Properties of laser-produced tin (Sn) plasmas were experimentally investigated for application to the Extreme Ultra-Violet (EUV) lithography. Optical thickness of the Sn plasmas affects strongly to
Tunable narrowband soft x-ray source for projection lithography
EUV emission from laser plasmas produced on low Z target material such as plastics and araldites that contain 1 to 10% concentrations of the elements 50 ≤ Z ≤ 70 emit narrow regions of intense
Spectroscopic characterization of laser-induced tin plasma
Optical emission spectroscopic studies have been carried out on a tin plasma generated using 1064-nm, 8-ns pulses from a Nd:yttrium aluminum garnet laser. Temperature and density were estimated from
Parametric optimization of a narrow-band 13.5-nm emission from a Li-based liquid-jet target using dual nano-second laser pulses
We demonstrate the applicability of a Li-based liquid jet as a regenerative source of narrow-band extreme-ultraviolet (EUV) emission at 13.5 nm. It was found that a conventionally used single laser
Monochromatic imaging and angular distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas
Properties of extreme ultraviolet (EUV) emission from laser-produced Sn and SnO2 plasmas were investigated. EUV emission images were taken with a monochromatic imager for 13.5nm with 4% bandwidth. It
Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas.
Experimental results indicate that control of the optical depth of the laser-produced tin (Sn) plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation.
Development of a target for laser-produced plasma EUV light source using Sn nano-particles
Nano-structured and tin-based targets have been fabricated by the pulsed-laser ablation method, in order to develop efficient and debris-free targets for the laser-produced plasma extreme ultraviolet
Debris mitigation in a laser-produced tin plume using a magnetic field
Debris mitigation in a laser-produced tin plume is one of the most important issues for its use as an extreme ultraviolet source in next generation lithography. We investigated the use of a magnetic
Simulation of the EUV spectrum of Xe and Sn plasmas
Complex spectra of Xe and Sn, and their feasibility for use in the lithographic extreme ultraviolet (EUV) source, are investigated. By combining calculations of atomic data using the HULLAC code and