Spatially Defined Surface Modification of Poly(methyl methacrylate) Using 172 nm Vacuum Ultraviolet Light

  title={Spatially Defined Surface Modification of Poly(methyl methacrylate) Using 172 nm Vacuum Ultraviolet Light},
  author={A. Hozumi and T. Masuda and Kazuyuki Hayashi and H. Sugimura and O. Takai and T. Kameyama},
Hydrophilization of poly(methyl methacrylate) (PMMA) substrates has been demonstrated using a excimer lamp radiating vacuum ultraviolet (VUV) light of 172 nm in wavelength. In this study, we have particularly focused on the effects of atmospheric pressure during VUV irradiation. Each of the substrates was photoirradiated with VUV light under a pressure of 10, 103, or 105 Pa. Although in each case the hydrophobic PMMA surface became hydrophilic, the water−contact angle and photooxidation rate… Expand
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