Simultaneous layout migration and decomposition for double patterning technology

@article{Hsu2009SimultaneousLM,
  title={Simultaneous layout migration and decomposition for double patterning technology},
  author={Chin-Hsiung Hsu and Yao-Wen Chang and Sani R. Nassif},
  journal={2009 IEEE/ACM International Conference on Computer-Aided Design - Digest of Technical Papers},
  year={2009},
  pages={595-600}
}
Double patterning technology (DPT) and layout migration are two closely related problems on design for manufacturability in the nanometer era. DPT decomposes a layout into two masks and applies double exposure patterning to increase the pitch size and thus printability. In this paper, we present the first algorithm in the literature for the simultaneous layout migration and decomposition (SMD) problem. Our algorithm first constructs a conflict graph and DPT-aware constraint graphs, and then… CONTINUE READING
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References

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Showing 1-9 of 9 references

Double pattern eda solutions for 32nm hp and beyond

  • G. E. Bailey, A. Tritchkov, +6 authors J. Versluijs
  • 65211K. SPIE,
  • 2007

Double patterning technology: process-window analysis in a many-dimensional space. volume 6607, page 66072S

  • A. Sezginer, B. Yenikaya, W. Staud
  • 2007
1 Excerpt

An algorithm for optimal two-dimensional compaction of vlsi layouts

  • M. Schiag, Y. Z. Liao, C. K. Wong
  • In Proceedings of ICCAD,
  • 1983
2 Excerpts

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