Simultaneous layout migration and decomposition for double patterning technology

  title={Simultaneous layout migration and decomposition for double patterning technology},
  author={Chin-Hsiung Hsu and Yao-Wen Chang and Sani R. Nassif},
  journal={2009 IEEE/ACM International Conference on Computer-Aided Design - Digest of Technical Papers},
Double patterning technology (DPT) and layout migration are two closely related problems on design for manufacturability in the nanometer era. DPT decomposes a layout into two masks and applies double exposure patterning to increase the pitch size and thus printability. In this paper, we present the first algorithm in the literature for the simultaneous layout migration and decomposition (SMD) problem. Our algorithm first constructs a conflict graph and DPT-aware constraint graphs, and then… CONTINUE READING
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