Simulation of the Novel Gradually Low-K Dielectric Structure for Crosstalk Reduction in VLSI and Comparison with Low-K Technology

Crosstalk noise and delay uncertainty problem are two major issues in modern VLSI design. In this paper, we have proposed a new dielectric structure for integrated circuits that reduces crosstalk noise and delay uncertainty, considerably. This structure is in contrast to the conventional Cu/Low-K technology. We have extracted the RLC model of new structure… CONTINUE READING