Simple removal technology using ozone solution for chemically-stable polymer used for MEMS

Abstract

This paper reports simple removal technology using ozone solution for chemically-stable polymers such as SU-8, BCB, polyimide and carbonized resist. Conventionally, these polymers are difficult to remove completely by O<inf>2</inf> plasma and organic solutions because of their chemical stability and inorganic additives. In this study, these polymers were… (More)

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@article{Yanagida2011SimpleRT, title={Simple removal technology using ozone solution for chemically-stable polymer used for MEMS}, author={Hidesuke Yanagida and S. Yoshida and Misa Esashi and S. Tanaka}, journal={2011 IEEE 24th International Conference on Micro Electro Mechanical Systems}, year={2011}, pages={324-327} }