Silicon shadow mask preparation by vertical preferential etching

@article{Roenker1982SiliconSM,
  title={Silicon shadow mask preparation by vertical preferential etching},
  author={K. P. Roenker and Kiki Ikossi-Anastasiou},
  journal={IEEE Electron Device Letters},
  year={1982},
  volume={3},
  pages={418-419}
}
Silicon shadow masks were prepared by vertical etching 

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