Semiconductor integrated circuit system

@inproceedings{2001SemiconductorIC,
  title={Semiconductor integrated circuit system},
  author={기따가와노부따까 and 다나베겐},
  year={2001}
}
PURPOSE: To suppress the characteristics variation of MOS transistors due to charging by a plasma to lessen the influence causing the characteristics deterioration of an analog circuit on both gate electrodes of the MOS transistors paired in the analog circuit of a MOS type semiconductor integrated circuit device in a process of patterning a metal wiring layer by plasma etching. CONSTITUTION: A MOS type semiconductor integrated circuit device comprises diodes 14 directly connected with metal… CONTINUE READING