Selective separation of phosphate and fluoride from semiconductor wastewater.

Abstract

Hydrofluoric acid (HF) and phosphoric acid (H(3)PO(4)) are widely used in semiconductor industry for etching and rinsing purposes. Consequently, significant amount of wastewater containing phosphate and fluoride is generated. Selective separation of phosphate and fluoride from the semiconductor wastewater, containing 936 mg/L of fluoride, 118 mg/L of… (More)
DOI: 10.2166/wst.2009.157

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Cite this paper

@article{Warmadewanthi2009SelectiveSO, title={Selective separation of phosphate and fluoride from semiconductor wastewater.}, author={B Warmadewanthi and J. C. Liu}, journal={Water science and technology : a journal of the International Association on Water Pollution Research}, year={2009}, volume={59 10}, pages={2047-53} }