Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography

@inproceedings{Yang2007SelectiveDO,
  title={Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography},
  author={Ki Yeon Yang and J Kim and Kyeong Jae Byeon and Heon Seok Lee},
  year={2007}
}
In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was… CONTINUE READING