Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing.

@article{Park2004SelectiveAL,
  title={Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing.},
  author={Mi hener Park and Young Joon Jang and Hyung M. Sung-Suh and Myung Mo Sung},
  journal={Langmuir : the ACS journal of surfaces and colloids},
  year={2004},
  volume={20 6},
  pages={2257-60}
}
We demonstrate a selective atomic layer deposition of TiO2 thin films on patterned alkylsiloxane self-assembled monolayers. Microcontact printing was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. The patterned monolayers define and direct the selective deposition of the TiO2 thin film using atomic layer deposition. The selective atomic layer deposition is based on the fact that the TiO2 thin film is selectively deposited only on the regions exposing the silanol… CONTINUE READING
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