Selective Deposition of Silicon at Room Temperature Using DC Microplasmas

@article{Wilson2007SelectiveDO,
  title={Selective Deposition of Silicon at Room Temperature Using DC Microplasmas},
  author={C. G. Wilson and Y. B. Gianchandani},
  journal={IEEE Transactions on Plasma Science},
  year={2007},
  volume={35},
  pages={573-577}
}
This paper reports deposition of silicon at elevated and room temperatures in spatially localized areas of a microchip by plasma-enhanced chemical vapor deposition using microplasmas. The microplasmas are generated by providing dc power to thin-film Ti electrodes patterned on the microchip. Electrode arrangements include configurations in which multiple cathode elements share a single anode. At the operating pressures used, the plasma glow is confined to the region directly over the energized… CONTINUE READING