Scatterometry applied to microelectronics processing

@article{McNeil2000ScatterometryAT,
  title={Scatterometry applied to microelectronics processing},
  author={J. McNeil},
  journal={2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)},
  year={2000},
  pages={II37-II38}
}
  • J. McNeil
  • Published 2000
  • Materials Science
  • 2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)
This past decade has seen the development of a non-imaging optical dimensional metrology technique known as scatterometry. Scatterometry is a nondestructive optical technique that records and analyzes changes in the intensity of light reflected from a periodic scattering surface. By measuring and analyzing the light diffracted from a patterned periodic sample, the dimensions of the sample itself can be measured. Scatterometry exploits the sensitivity of diffraction from a sample to changes in… Expand

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