Scanning photoemission spectromicroscopic study of 4-nm ultrathin SiO(3.4) protrusions probe-induced on the native SiO(2) layer.

@article{Devan2011ScanningPS,
  title={Scanning photoemission spectromicroscopic study of 4-nm ultrathin SiO(3.4) protrusions probe-induced on the native SiO(2) layer.},
  author={Rupesh S. Devan and S Gao and Yu-Rong Lin and Shun-Rong Cheng and Chia-Er Hsu and Chia-Hao Chen and Hung-Wei Shiu and Yung Liou and Yuan-Ron Ma},
  journal={Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada},
  year={2011},
  volume={17 6},
  pages={944-9}
}
Atomic force microscopy probe-induced large-area ultrathin SiO(x) (x ≡ O/Si content ratio and x > 2) protrusions only a few nanometers high on a SiO(2) layer were characterized by scanning photoemission microscopy (SPEM) and X-ray photoemission spectroscopy (XPS). SPEM images of the large-area ultrathin SiO(x) protrusions directly showed the surface… CONTINUE READING